Applications of KrF excimer laser for processing of polycrystalline diamond films and hard amorphous (`diamond-like') carbon films grown by chemical vapor deposition are reported. A technique of selective-area deposition of diamond films on Si substrates is described. Smoothing of rough surface of as-grown films using a scanning laser beam, and high speed drilling of diamond films were realized. Laser etching of amorphous carbon in air is shown to occur by two mechanisms: (carbon oxidation, which provides etch rates of a few nm/pulse, and (2) physical ablation dominating at high fluences. Micron-sized patterns were produced in amorphous films using the `mild' laser-chemical etching regime without any damage of Si substrates. It is concluded that lasers are very efficient tools for patterning, polishing, and shaping of these two classes of the extremely hard and chemically inert materials.
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