High-temperature sapphire extrinsic Fizeau interferometer for strain measurements on silicon carbide materials

Tuan A. Tran; Jonathan A. Greene; M. Alcock; Kent A. Murphy; Russell G. May; Anbo Wang; George Z. Wang; Richard O. Claus; Jack E. Coate

doi:10.1117/12.166851

7 February 1994 High-temperature sapphire extrinsic Fizeau interferometer for strain measurements on silicon carbide materials

Tuan A. Tran, Jonathan A. Greene, M. Alcock, Kent A. Murphy, Russell G. May, Anbo Wang, George Z. Wang, Richard O. Claus, Jack E. Coate

Author Affiliations +

Proceedings Volume 2072, Fiber Optic Physical Sensors in Manufacturing and Transportation; (1994) https://doi.org/10.1117/12.166851
Event: Optical Tools for Manufacturing and Advanced Automation, 1993, Boston, MA, United States

Abstract

A high-temperature sapphire strain gage based on the in-line extrinsic fiber- optic Fizeau interferometer was used to measure strain imparted by a 4000 lb compressive load applied at a temperature of 1100 degree(s)C. Experimental strain sensitivities on the order of 1 (mu) (epsilon) were obtained.

Citation Download Citation

Tuan A. Tran, Jonathan A. Greene, M. Alcock, Kent A. Murphy, Russell G. May, Anbo Wang, George Z. Wang, Richard O. Claus, and Jack E. Coate "High-temperature sapphire extrinsic Fizeau interferometer for strain measurements on silicon carbide materials", Proc. SPIE 2072, Fiber Optic Physical Sensors in Manufacturing and Transportation, (7 February 1994); https://doi.org/10.1117/12.166851

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