Paper
15 February 1994 Fabrication and evaluation of a programmed transmission defect test mask
Larry S. Zurbrick, Paul DePesa, Ricardo A. Diola
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Abstract
Transmission defects are localized variations in the nominal transmission value of a photomask or reticle. Experience has shown that random transmission defects on reticles and photomasks have caused both device failures and reliability problems. In order to characterize the nature of transmission defects and the ability to detect them, the fabrication and evaluation of a programmed transmission defect test mask was undertaken. Using the programmed transmission test mask, quantitative data was obtained regarding the detectability of transmission errors on contact geometry.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Larry S. Zurbrick, Paul DePesa, and Ricardo A. Diola "Fabrication and evaluation of a programmed transmission defect test mask", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167265
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KEYWORDS
Photomasks

Defect detection

Semiconducting wafers

Defect inspection

Inspection

Lithography

Reticles

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