On-line optimization of stop-etch time

Songling Cao; R. Russell Rhinehart

doi:10.1117/12.167361

15 February 1994 On-line optimization of stop-etch time

Songling Cao, R. Russell Rhinehart

Proceedings Volume 2091, Microelectronic Processes, Sensors, and Controls; (1994) https://doi.org/10.1117/12.167361
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

Two separate modeling approaches are shown to be able to estimate the spatially local end point time distribution of a plasma etch, from nonochromatic emission data, before the etch is complete. The distribution can be used to determine optimum stop-etch time.

Citation Download Citation

Songling Cao and R. Russell Rhinehart "On-line optimization of stop-etch time", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); https://doi.org/10.1117/12.167361

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