Comparison of photoresist shelf life in PGMEA and CA solvent systems

William C. Nelson

doi:10.1117/12.175385

16 May 1994 Comparison of photoresist shelf life in PGMEA and CA solvent systems

William C. Nelson

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175385
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Use of safer photoresist solvents such as propylene glycol monomethyl ether acetate (PGMEA, PMA) has been steadily increasing as a positive photoresist casting solvent. This work compares the aging characteristics and shelf life of photoresist prepared with PGMEA versus cellosolve acetate (CA, 2-ethoxyethyl acetate). By comparing samples stored at elevated temperatures with those at room temperature, aging rates are evaluated on photosensitivity, contrast, thickness and absorbance. Using first order reaction kinetic assumptions, these aging rates are compared to product specification limits to estimate shelf life.

Citation Download Citation

William C. Nelson "Comparison of photoresist shelf life in PGMEA and CA solvent systems", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175385

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