Using behavior modeling for proximity correction

Michael L. Rieger; John P. Stirniman

doi:10.1117/12.175431

17 May 1994 Using behavior modeling for proximity correction

Michael L. Rieger, John P. Stirniman

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175431
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

A proximity correction system supporting zone-sampling behavior modeling (see SPIE 2197- 28, `Fast proximity correction with zone sampling,') is described. The data flow for correcting integrated circuit layout patterns is explained. We outline the steps needed to generate and optimize behavior models, that serve as correction `rules.'

Citation Download Citation

Michael L. Rieger and John P. Stirniman "Using behavior modeling for proximity correction", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175431

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available