Tandem limiter optimization

David J. Hagan; Tie Jun Xia; Ali A. Said; Eric W. Van Stryland

doi:10.1117/12.179584

6 July 1994 Tandem limiter optimization

David J. Hagan, Tie Jun Xia, Ali A. Said, Eric W. Van Stryland

Proceedings Volume 2229, Nonlinear Optical Materials for Switching and Limiting; (1994) https://doi.org/10.1117/12.179584
Event: SPIE's International Symposium on Optical Engineering and Photonics in Aerospace Sensing, 1994, Orlando, FL, United States

Abstract

The EZ-scan, an improved Z-scan technique, shows a sensitivity for measuring nonlinearly induced wavefront distortion of approximately equals (lambda) /10⁴. We show that the nonlinear refraction and nonlinear absorption coefficients can be determined separately by a single EZ-scan measurement. We describe application of this technique to several organic thin films.

Citation Download Citation

David J. Hagan, Tie Jun Xia, Ali A. Said, and Eric W. Van Stryland "Tandem limiter optimization", Proc. SPIE 2229, Nonlinear Optical Materials for Switching and Limiting, (6 July 1994); https://doi.org/10.1117/12.179584

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