New method of CD control for 64 Mbit-DRAM reticles

Masahiro Uraguchi; Hideaki Hasegawa; Yuhichi Yamamoto; Hideyuki Kanemitsu; Eiichi Hoshino; Akira Morishige

doi:10.1117/12.191946

3 November 1994 New method of critical dimension (CD) control for 64-Mbit-DRAM reticles

Masahiro Uraguchi, Hideaki Hasegawa, Yuhichi Yamamoto, Hideyuki Kanemitsu, Eiichi Hoshino, Akira Morishige

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191946
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

Using the chemically amplified negative resist SAL-601^TM (Shipley Microelectronics LTD) and iterative dry etching, we improved the CD yield of 64 Mbit-DRAM (0.35 micrometers design rule) reticles. SAL-601 features high contrast and high resolution, and iterative etching is a superior method in a dry etching process. To perform iterative dry etching with SAL-601, we needed a more vertical resist profile to measure a chromium pattern under the resist correctly. We had to also prevent deterioration of the resist sensitivity. This paper describes how these problems were solved.

Citation Download Citation

Masahiro Uraguchi, Hideaki Hasegawa, Yuhichi Yamamoto, Hideyuki Kanemitsu, Eiichi Hoshino, and Akira Morishige "New method of critical dimension (CD) control for 64-Mbit-DRAM reticles", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191946

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available