Thermochromism of metal-doped VO2 films deposited by dual-target sputtering

Ping Jin; Masato Tazawa; Kazuki Yoshimura; Takeshi Miki; K. Igarashi; Sakae Tanemura

doi:10.1117/12.185384

9 September 1994 Thermochromism of metal-doped VO₂ films deposited by dual-target sputtering

Ping Jin, Masato Tazawa, Kazuki Yoshimura, Takeshi Miki, K. Igarashi, Sakae Tanemura

Author Affiliations +

Proceedings Volume 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII; (1994) https://doi.org/10.1117/12.185384
Event: Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, 1994, Freiburg, Germany

Abstract

Thermochromic VO₂ films were prepared by reactive magnetron sputtering under various conditions of substrate temperature, total sputter pressure and oxygen flow ratio and characterized by XRD, RBS, AFM and spectrophotometry. Films with VO₂ single phase were formed from a fairly low substrate temperature of 300 degree(s)C by precisely controlling the oxygen flow ratio. The use of vanadium-nucleated substrates significantly improved the crystallinity of VO₂. Tungsten doped V_1-xW_xO₂ films with x equals 0 approximately 0.26 were formed by dual-target sputtering and the thermochromism of films was evaluated. The tungsten doping linearly hysteresis loop width.

Citation Download Citation

Ping Jin, Masato Tazawa, Kazuki Yoshimura, Takeshi Miki, K. Igarashi, and Sakae Tanemura "Thermochromism of metal-doped VO₂ films deposited by dual-target sputtering", Proc. SPIE 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, (9 September 1994); https://doi.org/10.1117/12.185384

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