Paper
28 September 1994 Optical-quality high-growth-rate, arc-jet CVD diamond
Tom A. McKenna, James T. Hoggins, John M. Trombetta, Paul Klocek, Charles E. Vaughan
Author Affiliations +
Abstract
Through a joint effort between Texas Instruments (TI) and Olin Aerospace Company (OAC), a supersonic hydrogen arc jet for high-growth-rate chemical vapor deposition (CVD) of thick layers of optical quality diamond has been developed for flat substrates as large as 8 inches in diameter and for hemispherical domes measuring 2.5 inches in diameter. An overview of this deposition system is presented, along with optical and structural analysis of the subsequently deposited material. Efforts to monitor the plasma chemistry, along with in-depth computer modeling of the gas phase chemistry and hydrodynamics of this supersonic jet, in order to produce a higher-growth-rate process while maintaining optical quality, are discussed. The current status of the overall performance of this deposition system and the resultant material are presented in relation to the requirements for high-speed-missile domes and windows.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tom A. McKenna, James T. Hoggins, John M. Trombetta, Paul Klocek, and Charles E. Vaughan "Optical-quality high-growth-rate, arc-jet CVD diamond", Proc. SPIE 2286, Window and Dome Technologies and Materials IV, (28 September 1994); https://doi.org/10.1117/12.187338
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Cited by 2 scholarly publications.
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KEYWORDS
Diamond

Hydrogen

Chemical vapor deposition

Plasma

Chemistry

Diffusion

Domes

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