Importance of mask technical specifications on the lithography error budget

Gary C. Escher

doi:10.1117/12.195839

7 December 1994 Importance of mask technical specifications on the lithography error budget

Gary C. Escher

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195839
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

The Semiconductor Industry Association (SIA) has identified a fifteen year roadmap of lithography requirements for gigabit device generations and beyond. Several lithography methods have been identified to meet the projected overlay, critical dimension control, and defectivity targets. Error budgets are useful in determining the overall capability of a new technology based on sub-component performance. Baseline error budget models used by the SIA Lithography roadmap committee are presented to highlight critical technology improvement areas, with emphasis on current and future mask capabilities.

Citation Download Citation

Gary C. Escher "Importance of mask technical specifications on the lithography error budget", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195839

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