Improving photomask linewidth measurement accuracy via emulated stepper aerial image measurement

James E. Potzick

doi:10.1117/12.195831

7 December 1994 Improving photomask linewidth measurement accuracy via emulated stepper aerial image measurement

James E. Potzick

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195831
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

The most significant contribution to uncertainty in the measurement of photomask linewidths is the rough shape of the edge of the etched chrome lines. This uncertainty can be greatly reduced if the emulated stepper aerial image of the feature is measured instead of its geometric linewidth. That is: measure what the photomask does, not what it is. Phase-shift and other kinds of mask can be measured in the same way.

Citation Download Citation

James E. Potzick "Improving photomask linewidth measurement accuracy via emulated stepper aerial image measurement", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195831

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