Paper
14 July 1995 Laser-induced damage in dielectrics with nanosecond to subpicosecond pulses II: theory
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Abstract
Our extensive measurements of damage thresholds for fused silica and several fluorides (LiF, CaF, MgF, and BaF) at 1053 and 526 nm for pulse durations, (tau) , ranging from 275 fs to 1 ns are reported elsewhere at this meeting. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with experimental results.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael D. Feit, Alexander M. Rubenchik, Bruce W. Shore, Brent C. Stuart, and Michael D. Perry "Laser-induced damage in dielectrics with nanosecond to subpicosecond pulses II: theory", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213727
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Cited by 6 scholarly publications.
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KEYWORDS
Ionization

Dielectrics

Scattering

Silica

Laser damage threshold

Absorption

Picosecond phenomena

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