Thermally induced structural and phase transformations of Mo-Si and MoSi2-Si x-ray multilayer mirrors

Anatoli I. Fedorenko; A. S. Garbuz; V. V. Kondratenko; Yurii P. Pershin; V. E. Pukha; O. V. Poltseva; S. A. Yulin; E. N. Zubarev

doi:10.1117/12.200276

23 January 1995 Thermally induced structural and phase transformations of Mo-Si and MoSi₂-Si x-ray multilayer mirrors

Anatoli I. Fedorenko, A. S. Garbuz, V. V. Kondratenko, Yurii P. Pershin, V. E. Pukha, O. V. Poltseva, S. A. Yulin, E. N. Zubarev

Author Affiliations +

Proceedings Volume 2453, X-Ray Optics and Surface Science; (1995) https://doi.org/10.1117/12.200276
Event: X-ray Optics and Surface Science, 1994, none, Russian Federation

Abstract

The effect of elevated temperatures on the structural stability of Mo - Si and MoSi₂ - Si X-ray multilayer mirrors was studied. Multilayers deposited by magnetron sputtering were annealed at temperatures ranging from 300 to 1300 K. A detailed picture of the thermally induced changes in the microstructure is obtained using several techniques including small- and large-angle X-ray scattering and transmission electron microscopy. The main causes of the degradation of Mo - Si mirrors is an interdiffusion mixing of silicon and molybdenum layers and a formation of MoSi₂ in both the hexagonal and tetragonal phases. The smoothening of interfaces in MoSi₂ - Si mirrors and increasing of their reflectance were observed after annealing at temperatures T < 800 K. The MoSi₂ - Si mirrors undergo a catastrophic degradation at T > 1000 K caused by a crystallization of amorphous Si and a recrystallization of hexagonal MoSi₂.

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Anatoli I. Fedorenko, A. S. Garbuz, V. V. Kondratenko, Yurii P. Pershin, V. E. Pukha, O. V. Poltseva, S. A. Yulin, and E. N. Zubarev "Thermally induced structural and phase transformations of Mo-Si and MoSi₂-Si x-ray multilayer mirrors", Proc. SPIE 2453, X-Ray Optics and Surface Science, (23 January 1995); https://doi.org/10.1117/12.200276

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