Optical investigations of electron gun evaporated SiO2 and TiO2 thin films

Claudian Georgescu

doi:10.1117/12.203489

8 March 1995 Optical investigations of electron gun evaporated SiO₂ and TiO₂ thin films

Claudian Georgescu

Proceedings Volume 2461, ROMOPTO '94: Fourth Conference in Optics; (1995) https://doi.org/10.1117/12.203489
Event: ROMOPTO '94: 4th Conference on Optics, 1994, Bucharest, Romania

Abstract

Films of SiO₂ and TiO₂ by electron gun reactive evaporation in ionized oxygen atmosphere were prepared. The optical properties: refractive index, absorptance, transmittance and stability of the films were investigated. The TiO₂ films have the same refractive index as the bulk--quartz glass--1.46 and for 633 nm the absorption is negligible. The TiO₂ films have refractive indexes up to 2.3 when deposited on unheated substrates (approximately 300 degree(s)C), while the absorption coefficient is less than 50 cm^-1 at 633 nm. All the deposited films of SiO₂ and TiO₂ proved to be mechanically stable and water resistant.

Citation Download Citation

Claudian Georgescu "Optical investigations of electron gun evaporated SiO₂ and TiO₂ thin films", Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); https://doi.org/10.1117/12.203489

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