Excimer laser induced photochemical surface treatment of teflon for adhesion

Masataka M. Murahara; Masayuki Okoshi; Koichi Toyoda

doi:10.1117/12.204980

31 March 1995 Excimer laser induced photochemical surface treatment of teflon for adhesion

Masataka M. Murahara, Masayuki Okoshi, Koichi Toyoda

Proceedings Volume 2502, Gas Flow and Chemical Lasers: Tenth International Symposium; (1995) https://doi.org/10.1117/12.204980
Event: Gas Flow and Chemical Lasers: Tenth International Symposium, 1994, Friedrichshafen, Germany

Abstract

A tough adhesivity of teflon and stainless steel using an epoxy resin-based bonding agent was performed. The chemical stability of teflon is attributed to the C-F bond composed. Thus, it is considered to pull out the fluorine atoms selectively from the area irradiated with an ArF excimer laser light and to substitute a functional group displaying excellent affinity with bonding agents to create a powerful adhesivity. The defluorination of the surface was performed with boron atoms which were photodissociated from orthoboric acid water solution. The hydroxyl groups, which have a good affinity with epoxy bonding agent, were substituted only at area exposed to the laser light. The modified teflon surface with the epoxy bonding agent, and shearing tensile strength were performed. The strength was 110 Kgf/cm2.

Citation Download Citation

Masataka M. Murahara, Masayuki Okoshi, and Koichi Toyoda "Excimer laser induced photochemical surface treatment of teflon for adhesion", Proc. SPIE 2502, Gas Flow and Chemical Lasers: Tenth International Symposium, (31 March 1995); https://doi.org/10.1117/12.204980

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