Amorphous stuctured Ta4B absorber on SiC membrane for x-ray mask

Tsutomu Shoki; Ryo Ohkubo; Gregory M. Wells; Yoichi Yamaguchi; Kuniaki Yamazaki; Franco Cerrina

doi:10.1117/12.212815

3 July 1995 Amorphous stuctured Ta₄B absorber on SiC membrane for x-ray mask

Tsutomu Shoki, Ryo Ohkubo, Gregory M. Wells, Yoichi Yamaguchi, Kuniaki Yamazaki, Franco Cerrina

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212815
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

Stress controllability, stress distribution and radiation stability of Ta₄B absorber film on SiC membrane were investigated in detail. A low stress Ta₄B film was deposited on as-deposited SiC membrane with excellent reproducibility by an rf magnetron sputtering using Ar gas. Ta₄B film with very low stress below 10 MPa and high thermal stability have been obtained by annealing. The film has amorphous structure and uniform stress distribution of +/- 2.5 MPa in a window area of 28 mm square. The Ta₄B film has been found to show high durability against SR irradiation. SR-induced displacement (3(sigma) ) of 0.8-micrometers -thick Ta₄B film on SiC membrane were X equals 29 and Y equals 24 nm after irradiation of 531 kJ/cm², which were within the measurement error of 30 nm.

Citation Download Citation

Tsutomu Shoki, Ryo Ohkubo, Gregory M. Wells, Yoichi Yamaguchi, Kuniaki Yamazaki, and Franco Cerrina "Amorphous stuctured Ta₄B absorber on SiC membrane for x-ray mask", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212815

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