Paper
25 September 1995 White-light spacial frequency multiplication using soft x rays
Max Wei, Eric M. Gullikson, James H. Underwood, T. Kenneth Gustafson, David T. Attwood Jr.
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Abstract
We have patterned a 0.25-micron period grating in SAL-601 photoresist using soft x-ray white-light spatial frequency multiplication. The configuration is that of a grating interferometer using two transmission gratings having the same period ((Lambda) equals 0.5 micron) and fabricated by electron beam lithography and lift-off. The first transmission grating splits an incoming x-ray beam into two paths and the second grating, operating in higher order, combines the two beams. A standing wave pattern is obtained at the intersection of the two beams and recorded by a photoresist coated substrate. This patterning technique has the advantage of multiplying the spatial frequency of the interferometer gratings by an even integer factor. Furthermore, the recording geometry is insensitive to both the longitudinal and transverse coherence of the illumination. Synchrotron bending magnet radiation from the advanced light source located at the Lawrence Berkeley National Laboratory was used as the source. The grating interferometer geometry has been used in the past to record white-light interference fringes using visible and ultraviolet light sources. We have used a two-grating interferometer to provide an initial demonstration of white-light spatial frequency doubling at soft x-ray wavelengths. By using this technique with shorter period parent gratings, it should be possible to patten gratings with higher resolution than electron beam lithography.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Max Wei, Eric M. Gullikson, James H. Underwood, T. Kenneth Gustafson, and David T. Attwood Jr. "White-light spacial frequency multiplication using soft x rays", Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); https://doi.org/10.1117/12.221679
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KEYWORDS
Diffraction gratings

Spatial frequencies

Interferometers

X-rays

Electron beam lithography

Photoresist materials

Beam splitters

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