Paper
25 September 1995 Synthesis and measurement of Os-Si multilayer mirrors optimized for the wavelength 380 Å
Igor V. Kozhevnikov, L. L. Balakireva, Anatoli I. Fedorenko, I. A. Kopealets, Vladimir E. Levashov, A. N. Stetsenko, I. I. Struk, Alexander V. Vinogradov
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Abstract
Flat and spherical Os - Si multilayer mirrors were synthesized and studied. Measured normal incidence reflectivity was 20% at the wavelength lambda equals 380 angstrom. The effect of impurities in silicon layers on the multilayer reflectivity in the ultrasoft x-ray region is discussed.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Igor V. Kozhevnikov, L. L. Balakireva, Anatoli I. Fedorenko, I. A. Kopealets, Vladimir E. Levashov, A. N. Stetsenko, I. I. Struk, and Alexander V. Vinogradov "Synthesis and measurement of Os-Si multilayer mirrors optimized for the wavelength 380 Å", Proc. SPIE 2520, Soft X-Ray Lasers and Applications, (25 September 1995); https://doi.org/10.1117/12.221637
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KEYWORDS
Multilayers

Reflectivity

Osmium

Silicon

Mirrors

X-rays

Spherical lenses

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