Study of resistance against photorefractive light-induced scattering in LiNbO3:Fe,Mg crystals

Guangyin Zhang; Jingjun Xu; Simin Liu; Qian Sun; Guoquan Zhang; Qiyin Fang; Chaoli Ma

doi:10.1117/12.217010

18 August 1995 Study of resistance against photorefractive light-induced scattering in LiNbO₃:Fe,Mg crystals

Guangyin Zhang, Jingjun Xu, Simin Liu, Qian Sun, Guoquan Zhang, Qiyin Fang, Chaoli Ma

Proceedings Volume 2529, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications; (1995) https://doi.org/10.1117/12.217010
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

In this paper, we report a new effect -- the threshold effect of incident light intensity for the photorefractive light-induced scattering in LiNbO₃:Fe, Mg crystals, which could be used as a simple, effective technique to suppress the photorefractively light-induced scattering and is useful for us to get the noise-free photorefractive devices.

Citation Download Citation

Guangyin Zhang, Jingjun Xu, Simin Liu, Qian Sun, Guoquan Zhang, Qiyin Fang, and Chaoli Ma "Study of resistance against photorefractive light-induced scattering in LiNbO₃:Fe,Mg crystals", Proc. SPIE 2529, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications, (18 August 1995); https://doi.org/10.1117/12.217010

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