Inspection planning for coordinate metrology

V. N. Narayan Namboothiri; M. S. Shunmugam

doi:10.1117/12.227227

21 November 1995 Inspection planning for coordinate metrology

V. N. Narayan Namboothiri, M. S. Shunmugam

Proceedings Volume 2596, Modeling, Simulation, and Control Technologies for Manufacturing; (1995) https://doi.org/10.1117/12.227227
Event: Photonics East '95, 1995, Philadelphia, PA, United States

Abstract

A novel model for CMM measurement process using the concept of Self Avoiding Walk is presented. The objective is to find out a sampling lattice which results in reduced measurement time without affecting the precision of the measurement. Sampling in honeycomb lattice is shown to have less mean square displacement than sampling in square lattice as a result of which sampling in honeycomb lattice requires less measurement time than sampling in square lattice. Further it is shown that the sampling in honeycomb lattice resembles the unaligned systematic sampling which again increases the precision of the sampling in honeycomb lattice.

Citation Download Citation

V. N. Narayan Namboothiri and M. S. Shunmugam "Inspection planning for coordinate metrology", Proc. SPIE 2596, Modeling, Simulation, and Control Technologies for Manufacturing, (21 November 1995); https://doi.org/10.1117/12.227227

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