One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask

Walter Daschner; Robert D. Stein; Pin Long; Chuck Wu; Sing H. Lee

doi:10.1117/12.239618

7 May 1996 One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask

Walter Daschner, Robert D. Stein, Pin Long, Chuck Wu, Sing H. Lee

Author Affiliations +

Proceedings Volume 2689, Diffractive and Holographic Optics Technology III; (1996) https://doi.org/10.1117/12.239618
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

Micro-optics such as diffractive optics and computer generated holograms are essential components for modern optical design. To reduce their unit fabrication cost we describe a method of reproducing micro-optics in quantities. A true gray-level mask was fabricated in High Energy Beam Sensitive (HEBS)-Glass by means of a single e-beam direct write step. This gray-level mask was used in a optical contact aligner to print a multilevel Diffractive Optical Element (DOE) in a single optical exposure. A chemically assisted ion beam etching process has been used to transfer the DOE structure from the resist into the substrate.

Citation Download Citation

Walter Daschner, Robert D. Stein, Pin Long, Chuck Wu, and Sing H. Lee "One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask", Proc. SPIE 2689, Diffractive and Holographic Optics Technology III, (7 May 1996); https://doi.org/10.1117/12.239618

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