Alternative soft x-ray source for step-and-scan lithography

Melvin A. Piestrup; Michael W. Powell; Louis W. Lombardo

doi:10.1117/12.240481

27 May 1996 Alternative soft x-ray source for step-and-scan lithography

Melvin A. Piestrup, Michael W. Powell, Louis W. Lombardo

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240481
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

As a synchrotron or excimer-laser alternative, this paper presents transition radiation as a soft x-ray source for step and scan lithography. This source offers high brightness, collimation, modest operating vacuum, ideal spectral characteristics and moderate cost. The x-ray radiation is emitted in a forward cone in the 0.5-1.8 keV range and generated by electron beams with moderate energies between 25-100 MeV. The radiator target consists of many thin metal foils of beryllium, which are separated by a vacuum. The target output power wavelength can be optimized for highest photoresist sensitivity, window transmission and minimal spurious exposure. For collimation, ellipsoidal-grazing-angle optics or capillary optics increase the mask/wafer image plane into a finite-line image. As in synchrotron systems, the line is then scanned for dose uniformity. For a 70-MeV 400-(mu) A-average-current electron beam, the total x-ray power delivered through the 1-micrometers Si window and 1-micrometers Si substrate to the photoresist in the photon energy in the desired bandwidth (0.5 to 1.8 keV) is 16 mW in a 22-mm X 32-mm area. With a 1-mJ/cm² resist (required for EUV-lithography), the exposure time would be 440 mS.

Citation Download Citation

Melvin A. Piestrup, Michael W. Powell, and Louis W. Lombardo "Alternative soft x-ray source for step-and-scan lithography", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240481

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KEYWORDS

X-rays

X-ray optics

Collimation

Lithography

Synchrotrons

Beryllium

X-ray sources

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