Compensation of intrafield registration error caused by process properties in optical lithography

Tae-Gook Lee; Seung-Chan Moon; Hee-Mok Lee; Jeong Soo Kim; Chul-Seung Lee; H. Y. Kim; Hee Kook Park

doi:10.1117/12.240097

21 May 1996 Compensation of intrafield registration error caused by process properties in optical lithography

Tae-Gook Lee, Seung-Chan Moon, Hee-Mok Lee, Jeong Soo Kim, Chul-Seung Lee, H. Y. Kim, Hee Kook Park

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240097
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

This paper describes the intra-field registration error caused by the mix of exposure illumination and isolation process independently. Modified illuminations such as annular, quadrupole, and small sigma aperture for phase shift mask are widely used to extend the feasible limits in the current optical process application. Meanwhile, each of the illumination conditions may cause the deterioration of the intra-field registration since they have different optical properties. Also isolation process in CMOS has been considered as a critical step causing the intra-field registration error induced by the wafer stress from the thermal cycle and the different type of films. The mix of illumination conditions, isolation schemes, the temperature and thickness of field oxidation were split to investigate their effects. And the compensation of intra-field registration error was performed by shot scale value.

Citation Download Citation

Tae-Gook Lee, Seung-Chan Moon, Hee-Mok Lee, Jeong Soo Kim, Chul-Seung Lee, H. Y. Kim, and Hee Kook Park "Compensation of intrafield registration error caused by process properties in optical lithography", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240097

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KEYWORDS

Semiconducting wafers

Oxidation

Image registration

Optical lithography

Optical properties

Error analysis

Fiber optic illuminators

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