Real-time monitoring by multiwavelength ellipsometry of the growth of silicon alloy multilayers and gradient index structures

Morten Kildemo; S. Deniau; Pavel Bulkin; Bernard Drevillon; Ola D. Hunderi

doi:10.1117/12.246805

19 August 1996 Real-time monitoring by multiwavelength ellipsometry of the growth of silicon alloy multilayers and gradient index structures

Morten Kildemo, S. Deniau, Pavel Bulkin, Bernard Drevillon, Ola D. Hunderi

Author Affiliations +

Proceedings Volume 2776, Developments in Optical Component Coatings; (1996) https://doi.org/10.1117/12.246805
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

Real time monitoring and control, by multiwavelength phase modulated ellipsometry of the growth of plasma deposited optical structures is presented. The transparent layers consists of SiO₂ SiN_x and oxynitrides. We present an efficient method for the estimation of the optical parameters based on a sliding window containing the last acquired measurements. This method is used to monitor the deposition of multilayer coatings with homogenous deposition conditions, and is also used in feedback control of such coatings. The sliding window method is further developed to follow slowly time-varying parameters such as the deposition rate. A preliminary study of a fast novel method based on the same principle for real time monitoring of refractive index gradients is described. As an example, the real time monitoring of the growth of a linear gradient index is demonstrated.

Citation Download Citation

Morten Kildemo, S. Deniau, Pavel Bulkin, Bernard Drevillon, and Ola D. Hunderi "Real-time monitoring by multiwavelength ellipsometry of the growth of silicon alloy multilayers and gradient index structures", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246805

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