Recent development of MCP collimators for x-ray lithography of semiconductor devices

A. N. Brunton

doi:10.1117/12.2316273

1 September 1996 Recent development of MCP collimators for x-ray lithography of semiconductor devices

A. N. Brunton

Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 2778G8 (1996) https://doi.org/10.1117/12.2316273
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of

Abstract

Soft X-ray collimators , based on established microchannel plate technology^1,2, are being developed in order to collimate the expanding beam from a laser-plasma X-ray source³. The collimation results in a parallel beam suitable for X-ray lithography of semiconductor devices such as the 1Gbit DRAM (Fig. 1).

Citation Download Citation

A. N. Brunton "Recent development of MCP collimators for x-ray lithography of semiconductor devices", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 2778G8 (1 September 1996); https://doi.org/10.1117/12.2316273

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