In-situ monitor and control using fast spectroscopic ellipsometry

John A. Woollam; Xiang Gao; Scott Heckens; James N. Hilfiker

doi:10.1117/12.246202

16 August 1996 In-situ monitor and control using fast spectroscopic ellipsometry

John A. Woollam, Xiang Gao, Scott Heckens, James N. Hilfiker

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246202
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance and spin-valve magnetic read-heads.

Citation Download Citation

John A. Woollam, Xiang Gao, Scott Heckens, and James N. Hilfiker "In-situ monitor and control using fast spectroscopic ellipsometry", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246202

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