Simultaneous oblique deposition from opposite azimuthal directions for fabrication of thin film retardation plates

Tomoyoshi Motohiro; Yasuhiko Takeda; Tatsumi Hioki; Shoji Noda

doi:10.1117/12.246223

16 August 1996 Simultaneous oblique deposition from opposite azimuthal directions for fabrication of thin film retardation plates

Tomoyoshi Motohiro, Yasuhiko Takeda, Tatsumi Hioki, Shoji Noda

Author Affiliations +

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246223
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

Obliquely vapor deposited thin film (OVD-TF) is characterized by its unique inclined columnar structure (ICS). In previous work, the form birefringence originated from ICS was utilized to form amorphous Ta₂O₅ thin film retardation plates (TF-RPs). By reducing the size of ICS in nm scale range, the film was durable and transparent getting rid of the haze inherent in usual OVD-TF. In the present work, again TF-RPs were formed on fused silica substrates but this time by simultaneous oblique deposition from two Ta₂O₅ sputtering sources located at opposite azimuthal directions in a specially designed sputter-deposition apparatus. A typical birefringence obtained was (Delta) n equals 0.087, 0.049 and 0.043 at the wavelength of 300 nm, 500 nm and 800 nm, respectively. A film of 2550 nm thick can make a quarter wave plate at 500 nm. The columnar structure which inclined no more this time does not cause birefringence for a normally incident light. The birefringence comes this time from the fact that the columns are less closely spaced in the plane of the vapor incidence (PVI) than normal to PVI. This is the first example that the birefringence of this type is utilized to fabricate TF-RPs. The growth mechanism of this anisotropic nm scale structure was discussed with 3D-simulation of ballistic deposition.

Citation Download Citation

Tomoyoshi Motohiro, Yasuhiko Takeda, Tatsumi Hioki, and Shoji Noda "Simultaneous oblique deposition from opposite azimuthal directions for fabrication of thin film retardation plates", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246223

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available