Fabrication of optomechanical structures suitable for microwave phase conjugation

Boris Tsap; Kristofer S. J. Pister; Harold R. Fetterman

doi:10.1117/12.251260

23 September 1996 Fabrication of optomechanical structures suitable for microwave phase conjugation

Boris Tsap, Kristofer S. J. Pister, Harold R. Fetterman

Proceedings Volume 2881, Microelectronic Structures and MEMS for Optical Processing II; (1996) https://doi.org/10.1117/12.251260
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States

Abstract

The fabrication and testing of optomechanical structure which can be used for microwave phase conjugation is described. It consists of the metal-coated dielectric elongated beams 1 mm X 100 micrometers X 10 micrometers suspended by nonconductive torsional springs attached to a microwave transparent frame. Standard photolithography techniques combined with dry XeF₂ etching yield hundred of rotating elements on a single 4' silicon wafer. Rotation of single elements, in a polarized electromagnetic field at 15 GHz, was measured and found to be in a good agreement with theory. This first experimental implementation of combining the concept of nonlinear microwave devices and microelectromechanical systems demonstrates the potential of an entirely new class of devices.

Citation Download Citation

Boris Tsap, Kristofer S. J. Pister, and Harold R. Fetterman "Fabrication of optomechanical structures suitable for microwave phase conjugation", Proc. SPIE 2881, Microelectronic Structures and MEMS for Optical Processing II, (23 September 1996); https://doi.org/10.1117/12.251260

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