Processing of amorphous silicon flat panel displays with large-area excimer lasers

Marc X. Stehle; Bruno Godard; Jean-Louis P. Stehle

doi:10.1117/12.271551

4 April 1997 Processing of amorphous silicon flat panel displays with large-area excimer lasers

Marc X. Stehle, Bruno Godard, Jean-Louis P. Stehle

Proceedings Volume 2987, Gas and Chemical Lasers and Applications II; (1997) https://doi.org/10.1117/12.271551
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

Historical background and present status of excimer laser annealing of amorphous silicon for poly-TFTs fabrication are presented. Scanning and single shot systems are compared both on the physical and economical aspects. Process optimization and process control using real time spectroscopic ellipsometry are also presented. Finally, some perspectives in the development of very high power excimer laser are also given.

Citation Download Citation

Marc X. Stehle, Bruno Godard, and Jean-Louis P. Stehle "Processing of amorphous silicon flat panel displays with large-area excimer lasers", Proc. SPIE 2987, Gas and Chemical Lasers and Applications II, (4 April 1997); https://doi.org/10.1117/12.271551

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