Photoresist materials: a historical perspective

C. Grant Willson; Ralph R. Dammel; Arnost Reiser

doi:10.1117/12.275984

7 July 1997 Photoresist materials: a historical perspective

C. Grant Willson, Ralph R. Dammel, Arnost Reiser

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.275984
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800's to today's efforts to develop 193 nm resist materials.

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C. Grant Willson, Ralph R. Dammel, and Arnost Reiser "Photoresist materials: a historical perspective", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.275984

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KEYWORDS

Photoresist developing

Photoresist materials

Photography

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