Paper
28 July 1997 Current status of the SR stepper development
Nobutoshi Mizusawa, Yutaka Watanabe, Shinichi Hara, Kenji Saitoh, Hiroshi Maehara, Mitsuaki Amemiya, Shunichi Uzawa
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Abstract
We describe some results of exposure experiments using the present prototype SR stepper which Canon has developed and also describe the novel technology development which is necessary to establish the next generation SR stepper for volume production. In the evaluation of the prototype machine, alignment performance, stage accuracy, and printing performance were examined, and we found the SR lithography can be applied to manufacturing devices beyond 0.15 micrometer level. In the technology development for the production machine, we have examined methods related to masks; they are reduction of thermal expansion, suppression out-of-plane displacement of mask membrane, and magnification correction. As a result of the examinations, we have a good perspective in development of a high-throughput SR stepper which is suitable for the production beyond 1 G-bit DRAM.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nobutoshi Mizusawa, Yutaka Watanabe, Shinichi Hara, Kenji Saitoh, Hiroshi Maehara, Mitsuaki Amemiya, and Shunichi Uzawa "Current status of the SR stepper development", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277256
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Cited by 2 scholarly publications.
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KEYWORDS
Photomasks

Lithography

Distortion

Prototyping

Semiconducting wafers

Optical alignment

Printing

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