New die-to-database mask inspection system with i-line optics for 256-Mbit and 1-Gbit DRAMs

Mitsuo Tabata; Kyoji Yamashita; Hideo Tsuchiya; Takehiko Nomura; Hiromu Inoue; Tomohide Watanabe; Toru Tojo; Hisakazu Yoshino

doi:10.1117/12.277266

28 July 1997 New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs

Mitsuo Tabata, Kyoji Yamashita, Hideo Tsuchiya, Takehiko Nomura, Hiromu Inoue, Tomohide Watanabe, Toru Tojo, Hisakazu Yoshino

Author Affiliations +

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277266
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

For mask defect inspection in 256 Mbit and 1 Gbit DRAMs, it is necessary to have high sensitivity of 0.2 - 0.1 micrometer. A new die-to-database mask inspection system MC-2000 for 256 Mbit and 1 Gbit DRAMs has been developed. This system has high resolution optics with i-line light and high NA lens, and high speed and high accuracy data processing circuit by new multilevel bit map pattern generator, so the system has both high detectability and high throughput. This paper describes system configuration which include optical system and mechanical system, the defect inspection method, and inspection performance including defect sensitivity.

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Mitsuo Tabata, Kyoji Yamashita, Hideo Tsuchiya, Takehiko Nomura, Hiromu Inoue, Tomohide Watanabe, Toru Tojo, and Hisakazu Yoshino "New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277266

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