Extreme ultraviolet spectroscopy of a laser plasma source for lithography

Fred Bijkerk; Alexander P. Shevelko; Leonid A. Shmaenok; S. S. Churilov

doi:10.1117/12.283984

14 October 1997 Extreme ultraviolet spectroscopy of a laser plasma source for lithography

Fred Bijkerk, Alexander P. Shevelko, Leonid A. Shmaenok, S. S. Churilov

Proceedings Volume 3157, Applications of X Rays Generated from Lasers and Other Bright Sources; (1997) https://doi.org/10.1117/12.283984
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

Spectra from various target materials from a KrF-laser plasma source have been investigated in the extreme UV spectral range between 12 and 17 nm using an off-Rowland grazing-incidence spectrograph. Additional calibration of the yield at 13 nm and measurement of the spatial and temporal characteristics of the plasma has been done using a combination of a multilayer mirror and XUV diode or fiber image carrier system.

Citation Download Citation

Fred Bijkerk, Alexander P. Shevelko, Leonid A. Shmaenok, and S. S. Churilov "Extreme ultraviolet spectroscopy of a laser plasma source for lithography", Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); https://doi.org/10.1117/12.283984

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available