Status Of Microstructure Fabrication

John M. Warlaumont

doi:10.1117/12.933143

24 March 1982 Status Of Microstructure Fabrication

John M. Warlaumont

Proceedings Volume 0316, High Resolution Soft X-Ray Optics; (1982) https://doi.org/10.1117/12.933143
Event: 1981 Brookhaven Conferences, 1981, Upton, United States

Abstract

The present capabilities of microlithography are discussed, with emphasis placed on resolution and pattern distortion. The current limits of optical reduction lithography, electron beam lithography, and optical and x-ray proximity printing are presented. It is shown that currently the major factor limiting resolution in electron beam lithography is electron scattering in the resist and substrate. Recent progress in the theoretical understanding of this scattering limit is discussed, and new techniques for reducing the resolution degradation caused by this scattering are described.

Citation Download Citation

John M. Warlaumont "Status Of Microstructure Fabrication", Proc. SPIE 0316, High Resolution Soft X-Ray Optics, (24 March 1982); https://doi.org/10.1117/12.933143

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