Deposition and properties of PLD grown RuO2 thin film

Xiaodong Fang; Minoru Tachiki; Takeshi Kobayashi

doi:10.1117/12.300697

20 February 1998 Deposition and properties of PLD grown RuO2 thin film

Xiaodong Fang, Minoru Tachiki, Takeshi Kobayashi

Proceedings Volume 3175, Third International Conference on Thin Film Physics and Applications; (1998) https://doi.org/10.1117/12.300697
Event: Third International Conference on Thin Film Physics and Applications, 1997, Shanghai, China

Abstract

RuO₂ thin films have been grown by the pulsed laser deposition (PLD) method. It was shown that the RuO₂ thin film were (110) oriented and in-plane ordered (epitaxially grown). The electrical and optical properties of the RuO₂ thin film have been measured. When grown at 700 degrees Celsius, the films exhibited resistivities as low as 39 (mu) (Omega) (DOT) cm at room temperature. The real and imaginary parts of the dielectric constant and complex refractive index for RuO₂ thin films were estimated in the photon energy range from 1.5 to 4.5 eV by spectroscopic ellipsometry measurements. A transition from the valence band to the conduction band was observed for RuO₂ thin films near 2.7 eV and the dependence of the refractive index on the deposition temperature was also observed.

Citation Download Citation

Xiaodong Fang, Minoru Tachiki, and Takeshi Kobayashi "Deposition and properties of PLD grown RuO2 thin film", Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); https://doi.org/10.1117/12.300697

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