Paper
26 August 1997 Irreversible gigantic modification of semiconductor optical properties
Alexander M. Kamuz, Pavel F. Oleksenko, T. A. Dyachenko
Author Affiliations +
Proceedings Volume 3182, Material Science and Material Properties for Infrared Optoelectronics; (1997) https://doi.org/10.1117/12.280452
Event: Material Science and Material Properties for Infrared Optoelectronics, 1996, Uzhgorod, Ukraine
Abstract
The irreversible gigantic modification (IGM) occurs in semiconductors under simultaneous action of strongly polar liquid, acceptors dissolved in it, and optical radiation in the region of fundamental absorption. The IGM phenomenon is found by the authors in the III-V and II-VI compound semiconductors. During the IGM process the reflection and transmission coefficients are gradually varying in a modified near-surface semiconductor region. This enables to reduce controllably the real part of the complex refractive index in a near-surface semiconductor region, vary its chemical composition and the luminescence spectrum. After IGM the modified semiconductor with the velocity of 100 ms/mm. Increasing a distance between the controlling and controlled beams enables to implement a time delay between signal. The time delay up to 1.7 seconds has been achieved experimentally. We have used the IGM phenomenon to fabricate elements and devices of the integrated semiconductor optics. The IGM phenomenon enables to make antireflective optical elements.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander M. Kamuz, Pavel F. Oleksenko, and T. A. Dyachenko "Irreversible gigantic modification of semiconductor optical properties", Proc. SPIE 3182, Material Science and Material Properties for Infrared Optoelectronics, (26 August 1997); https://doi.org/10.1117/12.280452
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KEYWORDS
Semiconductors

Optical semiconductors

Group III-V semiconductors

Group II-VI semiconductors

Optical properties

Optical components

Absorption

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