193-nm excimer laser microstepper system

Nadeem Hasan Rizvi; Julian S. Cashmore; Chris M. Solomon; Phil T. Rumsby; Malcolm C. Gower

doi:10.1117/12.280529

14 August 1997 193-nm excimer laser microstepper system

Nadeem Hasan Rizvi, Julian S. Cashmore, Chris M. Solomon, Phil T. Rumsby, Malcolm C. Gower

Proceedings Volume 3183, Microlithographic Techniques in IC Fabrication; (1997) https://doi.org/10.1117/12.280529
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore

Abstract

An excimer laser microstepper, intended for R and D studies of 193nm lithography, is described. System details such as the laser performance, beam transport, wafer handling and photoresist processes are outlined.

Citation Download Citation

Nadeem Hasan Rizvi, Julian S. Cashmore, Chris M. Solomon, Phil T. Rumsby, and Malcolm C. Gower "193-nm excimer laser microstepper system", Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); https://doi.org/10.1117/12.280529

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