Novel single-layer photoresist containing cycloolefins for 193 nm

Joo Hyeon Park; Dong-Chul Seo; Ki-Dae Kim; Sun-Yi Park; Seong-Ju Kim; Hosull Lee; Jae Chang Jung; Cheol-Kyu Bok; Ki-Ho Baik

doi:10.1117/12.312449

29 June 1998 Novel single-layer photoresist containing cycloolefins for 193 nm

Joo Hyeon Park, Dong-Chul Seo, Ki-Dae Kim, Sun-Yi Park, Seong-Ju Kim, Hosull Lee, Jae Chang Jung, Cheol-Kyu Bok, Ki-Ho Baik

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312449
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

New matrix resins containing maleic anhydride and cycloolefin units for ArF excimer laser resist have been developed. Several series of these matrix resins having good dry-etching durability were prepared by free radical polymerization using AlBN as free radical initiator. All of the resists using the matrix resins revealed good coating uniformity and adhesion to silicon wafer, and were readily soluble in a variety of resist solvents such as MMP, EEP, PGMEA and EL. In preliminary 193 nm testing a resist formulated with the matrix resins sulfonium triflate as photoacid generator afforded positive images with 0.14 micrometers L/S resolution. In this paper, we will discuss the polymerization results and lithographic properties for 193 nm exposure tool.

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Joo Hyeon Park, Dong-Chul Seo, Ki-Dae Kim, Sun-Yi Park, Seong-Ju Kim, Hosull Lee, Jae Chang Jung, Cheol-Kyu Bok, and Ki-Ho Baik "Novel single-layer photoresist containing cycloolefins for 193 nm", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312449

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