Resin fractionation effect for photoresist performance

Tatsuya Yamada; Yutaka Saito; Kunio Itoh

doi:10.1117/12.312446

29 June 1998 Resin fractionation effect for photoresist performance

Tatsuya Yamada, Yutaka Saito, Kunio Itoh

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312446
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Two different kinds of novolak resins are synthesized, one is a typical meta-cresol and para-cresol formaldehyde novolak resin and the other is a higher performance novolak resin, and which are fractionated into different molecular weight distributions. I-line photoresists with these different molecular weight distribution novolak resins are formulated and I-line photoresist performance is evaluated based on the Mw/Mn. From these consequence, it is found novolak resin has an optimum Mw/Mn value in the improvement of resolution and the improvement with resin fractionation is less than with different kind of novolak resin.

Citation Download Citation

Tatsuya Yamada, Yutaka Saito, and Kunio Itoh "Resin fractionation effect for photoresist performance", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312446

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