Present status and technical issues of x-ray lithography

Kimiyoshi Deguchi; Jiro Nakamura; Kazuya Nakanishi; Tadahito Matsuda

doi:10.1117/12.328845

1 September 1998 Present status and technical issues of x-ray lithography

Kimiyoshi Deguchi, Jiro Nakamura, Kazuya Nakanishi, Tadahito Matsuda

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328845
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

The past several years have seen many improvements in a wide range of lithographic components of x-ray lithography using synchrotron radiation, including compact SR sources, vertical steppers, x-ray mask, and resist materials, to overcome the low-throughput problem, to improve overlay accuracy, and to make SR lithography a viable and practical method. SR lithography has been used in the test fabrication of LSIs in 0.2- and 0.1- micrometers regions, and has demonstrated an ability to manufacture future LSIs. The infrastructure for widespread industrial use is now beginning to form.

Citation Download Citation

Kimiyoshi Deguchi, Jiro Nakamura, Kazuya Nakanishi, and Tadahito Matsuda "Present status and technical issues of x-ray lithography", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328845

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