Printability of backside reticle defects

William Waters Volk; James N. Wiley; James A. Reynolds

doi:10.1117/12.328839

1 September 1998 Printability of backside reticle defects

William Waters Volk, James N. Wiley, James A. Reynolds

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328839
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

A 6 inch by 6 inch by 0.250 inch test reticle was manufactured with contact arrays on the image side and arrays of opaque chrome defects on the backside. A focus exposure matrix was printed using a 5X i-line and a 4X DUV ASM stepper to determine the smallest backside defect that would print. A defect was considered printable if it left any visible mark on the resist. At i-line the isolated minimum printable backside defect (MPBD) was 60 micrometers and the clustered MPBD was a 10 micrometers defect in a 10 by 10 array with 40 micrometers centers. At DUV the isolated minimum printable backside defect was 30 micrometers and the clustered MPBD was a 5 micrometers defect in a 10 by 10 array with 20 micrometers centers. Printability was found to be inversely proportional to NA and sigma. For both clusters and isolated defects, printability appear to be a function of the total chrome area in the region. The smallest defects printed at the highest exposure.

Citation Download Citation

William Waters Volk, James N. Wiley, and James A. Reynolds "Printability of backside reticle defects", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328839

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