Use of line-width error detection for quality control in reticle fabrication

Yair Eran; Gidon Gottlib; Gad Greenberg; Jeremy Zelenko

doi:10.1117/12.328835

1 September 1998 Use of line-width error detection for quality control in reticle fabrication

Yair Eran, Gidon Gottlib, Gad Greenberg, Jeremy Zelenko

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328835
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-width variations becomes more vital in the quality control of advance reticle manufacturing processes. In this paper a new concept of operation is presented, for using an inspection tool in the monitoring of line-width variants for the purpose improving such quality control. The inspection tool use in this paper, is Orbot-Applied's RT8000ES Reticle Inspection tool, in which the newly developed Line Width Error Detector is embedded.

Citation Download Citation

Yair Eran, Gidon Gottlib, Gad Greenberg, and Jeremy Zelenko "Use of line-width error detection for quality control in reticle fabrication", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328835

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