Polarization of out-of-plane optical scatter from SiO2 films grown on photolithographically generated microrough silicon

Thomas A. Germer; Bradley W. Scheer

doi:10.1117/12.328451

30 October 1998 Polarization of out-of-plane optical scatter from SiO₂ films grown on photolithographically generated microrough silicon

Thomas A. Germer, Bradley W. Scheer

Author Affiliations +

Proceedings Volume 3426, Scattering and Surface Roughness II; (1998) https://doi.org/10.1117/12.328451
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

Bidirectional ellipsometry results are presented for scatter from SiO₂ films grown on photolithographically produced microrough silicon surfaces. The principle direction of the polarization and the degree of linear polarization for scatter directions out of the plane of incidence are compared to results of theoretical modeling for interfacial microroughness in the presence of dielectric layers. The results indicate that light scattered from these surfaces does not behave like that from two truly random rough correlated interfaces. Possible reasons for the lack of agreement between the model and the data are discussed.

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Thomas A. Germer and Bradley W. Scheer "Polarization of out-of-plane optical scatter from SiO₂ films grown on photolithographically generated microrough silicon", Proc. SPIE 3426, Scattering and Surface Roughness II, (30 October 1998); https://doi.org/10.1117/12.328451

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