Photolithography fabrication of sol-gel ridge waveguides

Rahmani Sara; Tahar Touam; Chantal Blanchetiere; Z. Saddiki; Kalaichelvi Saravanamuttu; Xin M. Du; Jacek Chrostowski; Mark P. Andrews; S. Iraj Najafi

doi:10.1117/12.312911

6 July 1998 Photolithography fabrication of sol-gel ridge waveguides

Rahmani Sara, Tahar Touam, Chantal Blanchetiere, Z. Saddiki, Kalaichelvi Saravanamuttu, Xin M. Du, Jacek Chrostowski, Mark P. Andrews, S. Iraj Najafi

Author Affiliations +

Proceedings Volume 3469, Organic-Inorganic Hybrid Materials for Photonics; (1998) https://doi.org/10.1117/12.312911
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

We report on fabrication of ridge waveguides in UV-light sensitive glass sol-gel thin films, deposited on silicon substrate, using a simple photolithography process. The single-layer films are prepared at low temperature and deep UV-light (DUV) is employed to make the waveguides. The effect of fabrication parameters on waveguide shape is investigated.

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Rahmani Sara, Tahar Touam, Chantal Blanchetiere, Z. Saddiki, Kalaichelvi Saravanamuttu, Xin M. Du, Jacek Chrostowski, Mark P. Andrews, and S. Iraj Najafi "Photolithography fabrication of sol-gel ridge waveguides", Proc. SPIE 3469, Organic-Inorganic Hybrid Materials for Photonics, (6 July 1998); https://doi.org/10.1117/12.312911

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