Technological aspects of deep proton lithography for the fabrication of micro-optical elements for photonics in computing applications

Patrik Tuteleers; Pedro Vynck; Heidi Ottevaere; Valerie Baukens; Guy Verschaffelt; Stefan Kufner; Maria Kufner; Alex Hermanne; Irina P. Veretennicoff; Hugo Thienpont

doi:10.1117/12.308977

22 May 1998 Technological aspects of deep proton lithography for the fabrication of micro-optical elements for photonics in computing applications

Patrik Tuteleers, Pedro Vynck, Heidi Ottevaere, Valerie Baukens, Guy Verschaffelt, Stefan Kufner, Maria Kufner, Alex Hermanne, Irina P. Veretennicoff, Hugo Thienpont

Author Affiliations +

Proceedings Volume 3490, Optics in Computing '98; (1998) https://doi.org/10.1117/12.308977
Event: Optics in Computing '98, 1998, Bruges, Belgium

Abstract

The technology of deep proton lithography in PMMA (poly methyl methacrylate) is a fabrication method for monolithic integrated refractive micro-optical elements and micro-mechanical holder structures, which allows structural depths in the order of several hundred microns[l.21. Different optical functions can he fabricated in one block and form monolithic integrated optical systems. In addition mechanical support structures and alignment features can he integrated with these optical systems. This paper will focus mainly on the technological requirements of the irradiation, development and diffusion setups. which are necessary to achieve predictable and reproducible results with deep proton lithography.

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Patrik Tuteleers, Pedro Vynck, Heidi Ottevaere, Valerie Baukens, Guy Verschaffelt, Stefan Kufner, Maria Kufner, Alex Hermanne, Irina P. Veretennicoff, and Hugo Thienpont "Technological aspects of deep proton lithography for the fabrication of micro-optical elements for photonics in computing applications", Proc. SPIE 3490, Optics in Computing '98, (22 May 1998); https://doi.org/10.1117/12.308977

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