Paper
7 May 1999 RF- and dc-plasma-assisted laser deposition of a-CNx thin films
Rumen I. Tomov, Miroslav Jelinek, Jiri Bulir
Author Affiliations +
Proceedings Volume 3571, Tenth International School on Quantum Electronics: Laser Physics and Applications; (1999) https://doi.org/10.1117/12.347649
Event: 10th International School on Quantum Electronics: Lasers: Physics and Applications, 1998, Varna, Bulgaria
Abstract
Carbon nitride thin films are candidates for various technological applications. Special kind of a-Cnx film, as (beta) -C3N4, is supposed to be material exhibiting extreme hardness--higher than diamond. Many groups are trying to synthesize a-CNx films (with goal of creation (beta) -C3N4 phase), but concentration of nitrogen in films is still low. We have created series of nitrogenated amorphous carbon films in nitrogen atmosphere from graphite target by pulsed laser deposition. Additional DC and RF discharges were ignited in order to increase the reactivity of the nitrogen. Film properties were analyzed by X-ray diffraction and spectroscopic ellipsometry. The effects of the discharges on the C-N stoichiometry and on chemical bonding were studied. The N/C ratio increased with higher RF and DC plasma densities up to value of 0.25. Maximum values were reached at the nitrogen pressure twice lower for rf discharge than dc discharge assisted deposition. C-N stoichiometry and chemical bonding were investigated by Fourier transform infrared spectroscopy, X- ray Photoelectron Spectroscopy and Raman spectroscopy. Only films deposited at higher rf plasma power density showed the presence of triple bonded C equalsV N stretching mode.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rumen I. Tomov, Miroslav Jelinek, and Jiri Bulir "RF- and dc-plasma-assisted laser deposition of a-CNx thin films", Proc. SPIE 3571, Tenth International School on Quantum Electronics: Laser Physics and Applications, (7 May 1999); https://doi.org/10.1117/12.347649
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Nitrogen

Plasma

Carbon

Ions

FT-IR spectroscopy

Thin films

Raman spectroscopy

Back to Top