Roughness characterization of ultrasmooth surfaces using common-path interferometry

Baishi Wang; S. P. Marchese-Ragona; Thomas C. Bristow

doi:10.1117/12.343706

29 March 1999 Roughness characterization of ultrasmooth surfaces using common-path interferometry

Baishi Wang, S. P. Marchese-Ragona, Thomas C. Bristow

Proceedings Volume 3619, Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays; (1999) https://doi.org/10.1117/12.343706
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

The spatial frequency response, height sensitivity and system noise of a scanning common-path interferometer have been studied. The impulse response function and the frequency transfer function of the system are obtained analytically using Fresnel diffraction integral. Experimental results are also given. The results show that the system covers a broad spatial frequency range from 2 X 10^-5/micrometer to 3/micrometer. The height sensitivity of the system is better than 0.01 angstrom. System stationary noise less than 0.1 angstrom RMS is achievable without additional noise reduction post-process. Measurement of an ultra-smooth silicon substrate with a sub-angstrom roughness is successfully demonstrated. Measurement of a smooth glass substrate is also shown.

Citation Download Citation

Baishi Wang, S. P. Marchese-Ragona, and Thomas C. Bristow "Roughness characterization of ultrasmooth surfaces using common-path interferometry", Proc. SPIE 3619, Surface Characterization for Computer Disks, Wafers, and Flat Panel Displays, (29 March 1999); https://doi.org/10.1117/12.343706

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