Considerations for the use of application-specific photoresists

John L. Sturtevant; Benjamin C. P. Ho; Kevin D. Lucas; John S. Petersen; Chris A. Mack; Edward W. Charrier; William C. Peterson; Nobu Koshiba; Gregg A. Barnes

doi:10.1117/12.350217

11 June 1999 Considerations for the use of application-specific photoresists

John L. Sturtevant, Benjamin C. P. Ho, Kevin D. Lucas, John S. Petersen, Chris A. Mack, Edward W. Charrier, William C. Peterson, Nobu Koshiba, Gregg A. Barnes

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350217
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In recent years, photoresists suppliers have migrated to offering a full palette of resist chemistries and processes which are specifically tailored for particular pattern types and/or exposure processes. Thus we now see designations such as 'contact resists', 'isolated line resists', 'dense line resists', 'attenuated phase shift resist', etc. This specialization offers the lithographer more choices for continual performance improvement and optimization, but implementation of multiple resist platforms in manufacturing can be problematic. In this paper, we examine the design criteria and efficacy of pattern- and application-specific photoresist versus a generic 'multi-purpose' material, and identify some of the trade-offs which can be expected when employing these resists. Generalized ideal resist behaviors are presented for different pattern criteria, including proximity bias. Both experimental and simulation results are given.

Citation Download Citation

John L. Sturtevant, Benjamin C. P. Ho, Kevin D. Lucas, John S. Petersen, Chris A. Mack, Edward W. Charrier, William C. Peterson, Nobu Koshiba, and Gregg A. Barnes "Considerations for the use of application-specific photoresists", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350217

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available