Resolution and DOF improvement through the use of square-shaped illumination

Bruce W. Smith; Lena Zavyalova; S. G. Smith; John S. Petersen

doi:10.1117/12.354352

26 July 1999 Resolution and DOF improvement through the use of square-shaped illumination

Bruce W. Smith, Lena Zavyalova, S. G. Smith, John S. Petersen

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354352
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

As optical lithography is pushed to smaller dimensions, methods of resolution enhancement are considered necessary. Illumination modification is getting a good deal of attention, through strong and weak off-axis methods. The shape of an illumination profile does not need to be circular, especially if X/Y feature orientation is considered. This paper describes the improvements in imaging that are possible through use of source shapes that have various degrees of square character. Applications are discussed and interaction with optical proximity correction, aberration, and other imagin factors are addressed.

Citation Download Citation

Bruce W. Smith, Lena Zavyalova, S. G. Smith, and John S. Petersen "Resolution and DOF improvement through the use of square-shaped illumination", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354352

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